林建平;吴杨微;关贵清;黄光彩;赖发春;

• 1:宁德师范学院物理与电气工程系
• 2:福建师范大学物理与能源学院

摘要(Abstract)：

采用直流磁控溅射方法在石英基片上沉积铬薄膜.研究溅射功率、工作气压对铬薄膜结构、电学和光学性质的影响.利用X射线衍射仪、分光光度计和Van der Pauw方法分别检测薄膜的结构、光学和电学特性,利用德鲁特模型和薄膜的透射、反射光谱计算薄膜的厚度和光学常数.结果表明:制备的铬薄膜为体心立方的多晶态;在工作气压0.6Pa一定时,随着溅射功率从40W增加到120W,沉积速率呈非线性增加,薄膜更加致密,电阻率连续降低,在550nm波长处,薄膜的折射率从3.52增大到功率80W时的最大值(3.88),尔后逐渐减小至3.69;消光系数从1.50逐渐增大到2.20;在溅射功率80W一定时,随着工作气压从0.4Pa增加到1.2Pa,沉积速率呈近线性降低,薄膜的电阻率逐渐变大,在550nm波长处,折射率从3.88减小到3.62,消光系数从2.55减小到1.48.

关键词(KeyWords)： 磁控溅射;铬薄膜;溅射功率;工作气压;光电学性质

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金资助项目(11074041);; 宁德师范学院服务海西建设项目(2011H208;2010H301)

作者(Authors): 林建平;吴杨微;关贵清;黄光彩;赖发春;

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